6 September 1995 Novel integrated silicon micromechanical/optical pressure sensor
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Abstract
A novel integrated silicon micro-mechanical/optical pressure sensor is presented. Using the standard IC process and the silicon anisotropic etching technology, an optical strip waveguide which functions as the pressure-sensing and optical signal transmitting element, a thin silicon membrane layer and a photoelectric detector are all integrated on a three-dimensional silicon wafer. The sensor's structure, principle of operation, fabrication processes and test results are presented. This novel silicon integrated micro-mechanical/optical pressure sensor which is small, reliable, sensitive, inexpensive and does not need an external electrical supply may have many potential applications. Keywords: pressure sensor, micro-mechanical, thin silicon membrane, optical strip waveguide, anisotropic etching
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhiyu Wen, Long Fei, Xianxin Zhong, Youli Li, "Novel integrated silicon micromechanical/optical pressure sensor", Proc. SPIE 2542, Optomechanical and Precision Instrument Design, (6 September 1995); doi: 10.1117/12.218667; https://doi.org/10.1117/12.218667
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