Interferometric reflection moire

Cesar A. Sciammarella; Olivier Combell

doi:10.1117/12.212632

23 June 1995 Interferometric reflection moire

Cesar A. Sciammarella, Olivier Combell

Proceedings Volume 2545, Interferometry VII: Applications; (1995) https://doi.org/10.1117/12.212632
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

A new reflection moire technique is introduced in this paper. The basic equations that relate the measurement of slopes to the basic geometric and optical parameters of the system are derived. The sensitivity and accuracy of the method are discussed. Examples of application to the study of silicon wafers and electronic chips are given.

Citation Download Citation

Cesar A. Sciammarella and Olivier Combell "Interferometric reflection moire", Proc. SPIE 2545, Interferometry VII: Applications, (23 June 1995); https://doi.org/10.1117/12.212632

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