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25 September 1995 Molecular beam study of N2 scattering from Si(100)
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Abstract
The scattering of N2 from Si(100) was studied using state-selective detection and molecular beam techniques. Both trapping-desorption and direct inelastic scattering channels were observed. For an incident N2 energy of 0.08 eV, the trapping-desorption probability was found to be essentially unity for surface temperatures between 93 K and 573 K. The velocity and rotational state distributions of the desorbing molecules show that the nitrogen is fully accommodate with the surface. For an incident energy of 0.29 eV, a direct inelastic channel as well as the trapping-desorption channel was present. The rotational state distributions of both channels were studied as a function of surface temperature and incident energy.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jennifer L. W. Siders and Greg O. Sitz "Molecular beam study of N2 scattering from Si(100)", Proc. SPIE 2547, Laser Techniques for Surface Science II, (25 September 1995); https://doi.org/10.1117/12.221476
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