RAIRS, TPD, and TOF-QMS study of the 248-nm photolysis of CH3I thin films on Ag(111)

S. R. Coon; K. B. Myli; Vicki H. Grassian

doi:10.1117/12.221478

25 September 1995 RAIRS, TPD, and TOF-QMS study of the 248-nm photolysis of CH₃I thin films on Ag(111)

S. R. Coon, K. B. Myli, Vicki H. Grassian

Proceedings Volume 2547, Laser Techniques for Surface Science II; (1995) https://doi.org/10.1117/12.221478
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

The 248 nm photochemistry of methyl iodide thin films was studied using reflection absorption infrared spectroscopy (RAIRS), temperature programmed desorption (TPD) and time-of-flight quadrupole mass spectrometry (TOF-QMS). The formation of two major photoproducts, CH₂I₂ and CH₄, in the film was characterized by RAIRS and TPD. At all laser energies used in this study, CH₃, I, and CH₃I were ejected into the gas phase. The CH₃ TOF distribution showed the signature of gas phase CH₃I photodissociation dynamics--two sharp peaks corresponding to production of iodine atoms in the I (²P_3/2) and I^* (²P_1/2) states. The TOF distributions of I and CH₃I were fit to Maxwell-Boltzmann distributions corresponding to temperatures of 1400 K and 1170 K, respectively. The photochemistry of methyl iodide thin films can be understood in terms of photoprocess occurring in the film and at the film surface.

Citation Download Citation

S. R. Coon, K. B. Myli, and Vicki H. Grassian "RAIRS, TPD, and TOF-QMS study of the 248-nm photolysis of CH₃I thin films on Ag(111)", Proc. SPIE 2547, Laser Techniques for Surface Science II, (25 September 1995); https://doi.org/10.1117/12.221478

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