Paper
1 September 1995 Homojunction interfacial workfunction internal photoemission (HIWIP) infrared detectors
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Abstract
A wavelength tunable far-infrared (FIR) detector based on the interfacial workfunction (IWF) between a heavily doped absorber/emitter layer and a lightly doped (or intrinsic) layer (same material) forming a homojunction is presented. The concept somewhat similar to the classic photoelectric effect was successfully demonstrated using commercial p-i-n structures. The forward biased Si, Ge, and InGaAs samples were operated at cryogenic temperatures. Threshold wavelengths ((lambda) t) from around 40 - 220 micrometers for Si and up to 240 micrometers for Ge were experimentally obtained. A model was developed to analyze the photoresponse and the dark current leading to detector figures of merit. The effect of the space charge region on the barrier height and the barrier position is investigated for a thick sample similar to the p-i-n structures.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. G. Unil Perera "Homojunction interfacial workfunction internal photoemission (HIWIP) infrared detectors", Proc. SPIE 2554, Growth and Characterization of Materials for Infrared Detectors II, (1 September 1995); https://doi.org/10.1117/12.218183
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Cited by 1 scholarly publication.
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KEYWORDS
Sensors

Silicon

Absorption

Scattering

Doping

Interfaces

Neodymium

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