New process for the controlled formation of ultrathin PtSi films for infrared detector applications

Alfonso Torres; Sabine Kolodinski; Ricardo A. Donaton; Karen Maex; P. Roussel; Hugo Bender

doi:10.1117/12.218187

1 September 1995 New process for the controlled formation of ultrathin PtSi films for infrared detector applications

Alfonso Torres, Sabine Kolodinski, Ricardo A. Donaton, Karen Maex, P. Roussel, Hugo Bender

Proceedings Volume 2554, Growth and Characterization of Materials for Infrared Detectors II; (1995) https://doi.org/10.1117/12.218187
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

A simple method for controlling the thickness of PtSi for infrared detectors is presented. Thicknesses of PtSi in the range of 2 - 5 nm can be controlled via the reaction kinetics of the silicidation. Compared to conventional furnace anneal, the thickness and homogeneity of the resulting PtSi-layers are independent of the deposited Pt-thickness. Superior uniformity, lower continuous film thicknesses of the PtSi-layers, and smoother PtSi/Si-interfaces than possible by conventional furnace anneal are achieved by applying this technique.

Citation Download Citation

Alfonso Torres, Sabine Kolodinski, Ricardo A. Donaton, Karen Maex, P. Roussel, and Hugo Bender "New process for the controlled formation of ultrathin PtSi films for infrared detector applications", Proc. SPIE 2554, Growth and Characterization of Materials for Infrared Detectors II, (1 September 1995); https://doi.org/10.1117/12.218187

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