PROCEEDINGS VOLUME 2621
15TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT '95 | 20-22 SEPTEMBER 1995
15th Annual BACUS Symposium on Photomask Technology and Management
15TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT '95
20-22 September 1995
Santa Clara, CA, United States
Photomask Pattern Generation
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 2 (8 December 1995); doi: 10.1117/12.228169
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Photomask Resist and Process
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 52 (8 December 1995); doi: 10.1117/12.228215
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Inspection and Repair
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 112 (8 December 1995); doi: 10.1117/12.228162
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 122 (8 December 1995); doi: 10.1117/12.228163
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Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 158 (8 December 1995); doi: 10.1117/12.228166
Metrology
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 168 (8 December 1995); doi: 10.1117/12.228167
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 181 (8 December 1995); doi: 10.1117/12.228168
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Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 198 (8 December 1995); doi: 10.1117/12.228171
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 208 (8 December 1995); doi: 10.1117/12.228172
Advanced Topics in Photomasks
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 216 (8 December 1995); doi: 10.1117/12.228173
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 228 (8 December 1995); doi: 10.1117/12.228174
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Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 256 (8 December 1995); doi: 10.1117/12.228177
Addtional Paper
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 614 (8 December 1995); doi: 10.1117/12.228178
Phase-Shifting Masks
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 266 (8 December 1995); doi: 10.1117/12.228179
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 273 (8 December 1995); doi: 10.1117/12.228181
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 291 (8 December 1995); doi: 10.1117/12.228182
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 300 (8 December 1995); doi: 10.1117/12.228183
Poster Session
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 312 (8 December 1995); doi: 10.1117/12.228184
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 319 (8 December 1995); doi: 10.1117/12.228185
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Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 374 (8 December 1995); doi: 10.1117/12.228191
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 386 (8 December 1995); doi: 10.1117/12.228192
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Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 527 (8 December 1995); doi: 10.1117/12.228206
The Optimum Solution: OPC and Beyond
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 534 (8 December 1995); doi: 10.1117/12.228208
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 546 (8 December 1995); doi: 10.1117/12.228209
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 558 (8 December 1995); doi: 10.1117/12.228210
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 568 (8 December 1995); doi: 10.1117/12.228211
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 577 (8 December 1995); doi: 10.1117/12.228212
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 588 (8 December 1995); doi: 10.1117/12.228213
Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, pg 597 (8 December 1995); doi: 10.1117/12.228214
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