Actual use of phase-shift mask

Yoshiro Yamada; Hiromasa Unno; Kazuaki Chiba; Eisei Karikawa; Yasutaka Kikuchi; Yusuke Hattori; Katsuhiro Kinemura

doi:10.1117/12.228179

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8 December 1995 Actual use of phase-shift mask

Yoshiro Yamada; Hiromasa Unno; Kazuaki Chiba; Eisei Karikawa; Yasutaka Kikuchi; Yusuke Hattori; Katsuhiro Kinemura

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Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228179
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

Attenuate phase shift masks have been developed for practical use because there are less limitations on the design, and mask defect repairs are easier. However, phase shift mask manufacturing technology improvement is needed not only for control of phase shift or transmission, but also higher accuracy and more precise patterns such as KrF application or for 4X reticle applications. This report shows the manufacturing method of the MoSiON attenuate phase shift mask with Cr border and its quality encourages its evaluation as a promising technique for finer patterns.

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Yoshiro Yamada, Hiromasa Unno, Kazuaki Chiba, Eisei Karikawa, Yasutaka Kikuchi, Yusuke Hattori, and Katsuhiro Kinemura "Actual use of phase-shift mask", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228179

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KEYWORDS

Chromium

Etching

Dry etching

Phase shifts

Manufacturing

Photomasks

Thin films

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