Current technological status of spatial-filtering method for soft defect detection

Tsuneyuki Hagiwara

doi:10.1117/12.228163

8 December 1995 Current technological status of spatial-filtering method for soft defect detection

Tsuneyuki Hagiwara

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228163
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

Laser-based mask inspection systems are indispensable to attaining better yield, in both the semiconductor manufacturing process and the mask manufacturing process, because of their high throughput. We describe this issue citing the operational principle of our AM-601D (A reticle particle inspection system that we manufacture, rated sensitivity is defined by 0.5 micrometer polystyrene latex spheres), which is based on a spatial filtering method with a raster scanning of a focused laser beam.

Citation Download Citation

Tsuneyuki Hagiwara "Current technological status of spatial-filtering method for soft defect detection", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228163

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