8 December 1995 Fabrication processes for SCALPEL mask blanks
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Abstract
SCALPELTM, (scanning with angular limitation projection electron-beam lithography) is a projection electron-beam lithography technique with the potential for high resolution and throughput that can extend the state of lithography below 0.18 micrometer. The success of this technology, developed at AT&T , is directly connected to the ability to manufacture a robust SCALPEL mask blank. An error budget analysis has been performed on the SCALPEL mask. This analysis has generated specific requirements for the mask blank. In this paper we discuss their impact on the mask blank fabrication and show that we are making good progress towards meeting these requirements.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Harold A. Huggins, Kevin J. Bolan, James Alexander Liddle, Milton L. Peabody, Regine G. Tarascon-Auriol, David L. Windt, "Fabrication processes for SCALPEL mask blanks", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228176; https://doi.org/10.1117/12.228176
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