8 December 1995 Inspection system qualification and integration into the mask manufacturing environment
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Abstract
Integration of a mask inspection system into a manufacturing environment poses new challenges to both the inspection engineer and the equipment supplier. Traditional specifications (limited primarily to sensitivity and uptime) are no longer sufficient to successfully integrate a system into a 7 by 24 manufacturing area with multiple systems. Issues such as system sensitivity matching, sensitivity characterization by defect type, operator training and certification standards, and real-time SPC control of the systems must be addressed. This paper outlines some of the techniques Intel Mask Operation uses for integration of a new inspection system into the manufacturing line. Specifically moving a beta- site type tool out of the beta-site mode and into volume production. Examples are presented, including installation for manufacturing (including ergonomic modifications), techniques for system-to-system matching, use of SPC charts to monitor system performance, and operator training/certifications. Relationships between system PMs, or other environmental changes, and the system sensitivity SPC control charts also are discussed.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rosanne LaVoy, Rosanne LaVoy, Ron Fujioka, Ron Fujioka, "Inspection system qualification and integration into the mask manufacturing environment", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228164; https://doi.org/10.1117/12.228164
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