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8 December 1995 Investigation of MEBES 4500 system composite performance
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MEBES systems are characterized by constituent error performance, whereas masks produced on pattern generators are characterized by composite error performance. System evaluation by constituent specification is notable for the ease with which system calibration can be obtained, monitored, and maintained. Constituent specifications need to be retained for these reasons. This work investigates the composite performance of a MEBES 4500 system when generating masks compared to system constituent performance. Masks with scan-centered and non-scan- centered patterns are characterized and compared with both MEBES-based MARKET metrology and independent tool-based metrology.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jim DeWitt, Joe Watson, David W. Alexander, Allen Cook, Leonard Gasiorek, Mark Mayse, Robert J. Naber, Wayne Phillips, and Charles A. Sauer "Investigation of MEBES 4500 system composite performance", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995);

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