8 December 1995 Novel techniques on photomask blanks enhancement for the laser reticle writer
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The laser writer (CORE, ALTA) has come to the front for advanced reticle fabrication, so that photomask blanks enhancement is much more to be desired for the application. We have aimed at a resist to accomplish the blanks enhancement by studying soft-baking conditions as the overall performance of a resist could be significantly affected by the baking conditions. During the study, we developed and established a novel technique to observe a resist behavior to the baking conditions, which is called DRAUGHT: 'dissolution rate analysis in unexposed area to gain the highest tone of a resist.' The study also resulted in a suggestion of indispensability of another novel technique called CPQ: 'chilled plate quench' to obtain superior CD uniformity with a resist on the leading edge 6025 blanks. By employing DRAUGHT and CPQ, an optimization and enhancement of photomask blanks was carried out, and the potential of a resist was fully brought out under the optimal baking condition probed out by the novel techniques. This paper describes details of our findings on the novel techniques of DRAUGHT and CPQ, results of photomask blanks enhancement, and an initial evaluation result of new resist candidates for the laser reticle writer.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hideo Kobayashi, Hideo Kobayashi, Keishi Asakawa, Keishi Asakawa, Yasunori Yokoya, Yasunori Yokoya, } "Novel techniques on photomask blanks enhancement for the laser reticle writer", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228217; https://doi.org/10.1117/12.228217

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