Powerful inspection and metrology tool for micro- and nanofabrication

Shyi-Long Shy; Tan Fu Lei; Kazumitsu Nakamura; Wen-An Loong; Chun-Yen Chang

doi:10.1117/12.228195

8 December 1995 Powerful inspection and metrology tool for micro- and nanofabrication

Shyi-Long Shy, Tan Fu Lei, Kazumitsu Nakamura, Wen-An Loong, Chun-Yen Chang

Proceedings Volume 2621, 15th Annual BACUS Symposium on Photomask Technology and Management; (1995) https://doi.org/10.1117/12.228195
Event: 15th Annual BACUS Symposium on Photomask Technology and Management '95, 1995, Santa Clara, CA, United States

Abstract

In this paper, a metrology for micro- and nanofabrication process has been implemented using an atomic force microscope (AFM). Deep submicron patterning on wafer and chromium photomask were done using well established e-beam direct write technology and evaluated using AFM. A fine pitch control method was proposed to fabricate grating pitch mask for the pitch measurement of AFM. It can finely control the grating pitch to 1 nm, less than the most pattern data unit (5 nm) used in electron beam lithography. AFM is a powerful metrology tool for deep submicron process. AFM was employed as an inspection tool for the evidence of the existence of quantum dots on the GaAs substrate, the quantum dots or islands can be inspected clearly. Good performance is obtained.

Citation Download Citation

Shyi-Long Shy, Tan Fu Lei, Kazumitsu Nakamura, Wen-An Loong, and Chun-Yen Chang "Powerful inspection and metrology tool for micro- and nanofabrication", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228195

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