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8 December 1995 Quality assurance of dielectric masks for laser ablation technology
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Abstract
Dielectric masks are one of several types of masks used for high energy excimer laser ablation. Excimer laser ablation is a process used to directly pattern materials without the use of resists or wet processing. The dielectric masks are formed from a multilayer stack of dielectric films deposited on a quartz substrate. These masks have low reflectivity in visible light, and the dielectric stack thickness ranges from 0.4 micrometer to 1.0 micrometer to achieve an optimum reflectivity for a specific application. These properties present the most significant challenges in the inspection and quality assurance of dielectric masks. This paper discusses the methods of critical dimension measurement and defect inspection that have been developed for dielectric laser ablation masks. Printability of defects and the application of a unique scanning inspection tool which uses ultraviolet light are discussed. Manufacturing performance data also are presented.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Doris Pulaski, Rajesh S. Patel, and James L. Speidell "Quality assurance of dielectric masks for laser ablation technology", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); https://doi.org/10.1117/12.228191
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