8 December 1995 Quality assurance of embedded attenuated phase-shift masks
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Hiroyuki Miyashita, Hiroshi Fujita, Toshifumi Yokoyama, Naoya Hayashi, Hisatake Sano, "Quality assurance of embedded attenuated phase-shift masks", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228178; https://doi.org/10.1117/12.228178
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