8 December 1995 Quality assurance of embedded attenuated phase-shift masks
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© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroyuki Miyashita, Hiroyuki Miyashita, Hiroshi Fujita, Hiroshi Fujita, Toshifumi Yokoyama, Toshifumi Yokoyama, Naoya Hayashi, Naoya Hayashi, Hisatake Sano, Hisatake Sano, } "Quality assurance of embedded attenuated phase-shift masks", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, (8 December 1995); doi: 10.1117/12.228178; https://doi.org/10.1117/12.228178
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