22 September 1995 Reduction of post develop residue using optimal developer chemistry and develop/rinse processes
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Abstract
This paper summarized a collection of work and experimentation on detecting, classifying and reducing post developer defects. Various experiments demonstrate the effects of substrate priming, pH shock at rinse, resist hydrophobicity, rinse methods and developer surfactants in reducing post develop defects.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
George P. Mirth, George P. Mirth, } "Reduction of post develop residue using optimal developer chemistry and develop/rinse processes", Proc. SPIE 2635, Microelectronic Manufacturing Yield, Reliability, and Failure Analysis, (22 September 1995); doi: 10.1117/12.221453; https://doi.org/10.1117/12.221453
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