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Improved figure-of-merit metric for CMOS transistor performance and its application to 0.25 um CMOS technologies
C-V model of the MOS structures with a shallow p-n junction for the electro-physical parameters and profile of the doping determination
Optimizing the performance of advanced nonvolatile memories using differentiated cell source and drain implants
Influence of the TiNx/TiSy/poly-Si gate preparation process on MOS-structure properties and reliability
Improved hot-carrier reliability of MOSFET analog performance with NO-Nitrided SiO2 gate dielectrics
Electrical characteristics of n- and p-MOSFETs with N2O-reoxidized NH3-nitrided N2O oxides as gate dielectrics
Characterization of SOG (spin on glass) fully etch back process for multilevel interconnection technology