19 September 1995 Deposition of thick zinc oxide films with a high resistivity
Author Affiliations +
Proceedings Volume 2639, Micromachining and Microfabrication Process Technology; (1995) https://doi.org/10.1117/12.221290
Event: Micromachining and Microfabrication, 1995, Austin, TX, United States
Abstract
ZnO is a well known piezoelectric material. Unfortunately, it is not easy to deposit thin films onto silicon with a high resistivity by using common deposition technologies. The use of such films is therefore strictly limited to high frequency applications. The goal of our work was to find out a new deposition technology that allows the deposition of ZnO films with a high resistivity. Furthermore we were looking for the deposition of film thicknesses in a range up to 20 micrometers for SAW-sensor and microactuator applications. The deposition of the ZnO films was carried out in a programmable RF-magnetron-sputtering-system. We sputtered from a pure zinc target with a variable gas composition that consists of argon and oxygen. We worked in an alternating mode to achieve a high resistivity of the films. After a deposition cycle at a sample temperature of about 30 degrees C with a ramp shaped power the silicon- samples were cooled during the following cycle in the gas atmosphere. The deposition rate we measured was dependent from the gas composition and the applied power in a range between 1,5 micrometers /h and 2,2 micrometers /h. We deposited films of a thickness of 20 micrometers . Between two sputtered aluminium electrodes the films had a resistivity in a range between 2*1010(Omega) cm and 2*1011(Omega) cm. The stress of the films could be influenced by the composition of the gases. The measured minimum stresses of the films were in a range of about 180 MPa. The films were also characterized by means of XRD- measurments. We found a weak < 101 > orientation of the layers perpendicular to the surface.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Norbert Schwesinger, Norbert Schwesinger, Heike Bartsch, Heike Bartsch, Frank Moeller, Frank Moeller, "Deposition of thick zinc oxide films with a high resistivity", Proc. SPIE 2639, Micromachining and Microfabrication Process Technology, (19 September 1995); doi: 10.1117/12.221290; https://doi.org/10.1117/12.221290
PROCEEDINGS
10 PAGES


SHARE
Back to Top