15 September 1995 Silicon membrane gyroscope with electrostatic actuation and sensing
Author Affiliations +
Proceedings Volume 2642, Micromachined Devices and Components; (1995); doi: 10.1117/12.221185
Event: Micromachining and Microfabrication, 1995, Austin, TX, United States
Abstract
Presented here are preliminary results on a resonant gyroscope that is very simple to fabricate. It is made using both silicon and glass substrates, and involves the minimum of mask steps. Actuation and detection are all achieved via capacitive means. The minimum rotation rate that has been able to be sensed is 300 degrees/s; improvements in the manufacturing process could reduce this to as low as 0.07 degrees/s before the rate detection would become limited by electrical noise.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
David Wood, George Cooper, James S. Burdess, Alun J. Harris, Jane L. Cruickshank, "Silicon membrane gyroscope with electrostatic actuation and sensing", Proc. SPIE 2642, Micromachined Devices and Components, (15 September 1995); doi: 10.1117/12.221185; https://doi.org/10.1117/12.221185
PROCEEDINGS
10 PAGES


SHARE
KEYWORDS
Electrodes

Gyroscopes

Silicon

Semiconducting wafers

Etching

Glasses

Boron

RELATED CONTENT

Micromechanical silicon precision scale
Proceedings of SPIE (April 10 2000)
Bonding techniques for single crystal TFT AMLCDs
Proceedings of SPIE (September 23 1996)
Miniature electron microscopes for lithography
Proceedings of SPIE (May 13 1994)
Batch-dissolved wafer process for low-cost sensor applications
Proceedings of SPIE (September 19 1995)

Back to Top