Paper
12 April 1996 Suspended YBaCuO microstructures on CeO2/YSZ membranes for sensitive bolometers
Laurence Mechin, Jean-Claude Villegier, Daniel Bloyet
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Abstract
We have succeeded in fabricating sensitive superconducting YBaCuO membrane bolometers by two original techniques on silicon and silicon-on-implanted-oxide (SIMOX) substrates. The first process is based on a silicon dry reactive ion etching (RIE) and the second on the selective SiO2 layer etching of a SIMOX substrate. On a 10 micrometers wide, 150 micrometers long 'RIE-type' suspended bridge, the best sensitivity and optical NEP are 1580 V/W and 2.10-12 W/(root)Hz respectively at 85 K, with a thermal response time of 750 microsecond(s) . These responsivity and NEP values, measured on non-optimized structures, are among the best reported for liquid nitrogen-cooled thermal detectors. In addition, very short response times in the order of 7 microsecond(s) are obtained on `SIMOX type' air-bridges.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Laurence Mechin, Jean-Claude Villegier, and Daniel Bloyet "Suspended YBaCuO microstructures on CeO2/YSZ membranes for sensitive bolometers", Proc. SPIE 2685, Photodetectors: Materials and Devices, (12 April 1996); https://doi.org/10.1117/12.237704
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Cited by 3 scholarly publications.
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KEYWORDS
Silicon

Bridges

Bolometers

Reactive ion etching

Etching

Silicon films

Superconductors

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