10 January 1996 Ultraviolet-light-imprinted sol-gel silica glass channel waveguides on silicon
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Abstract
We describe a new simplified process for inexpensive fabrication of low-loss (0.1 dB/cm) glass waveguides on silicon by ultraviolet light imprinting in photosensitive, organically modified sol-gel silica glass films prepared by one-step dip-coating process. The fabrication process is appealing because the buffer layer between waveguide and substrate is eliminated, and waveguides can be made in a few steps using low-cost equipment.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Iraj Najafi, C.-Y. Li, J. E. Chisham, Mark P. Andrews, Paul Coudray, Alireza Malek-Tabrizi, Nasser Peyghambarian, "Ultraviolet-light-imprinted sol-gel silica glass channel waveguides on silicon", Proc. SPIE 2695, Functional Photonic and Fiber Devices, (10 January 1996); doi: 10.1117/12.229957; https://doi.org/10.1117/12.229957
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