5 July 1996 Very large area YBa2 Cu3O7-δ film deposition
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Proceedings Volume 2697, Oxide Superconductor Physics and Nano-Engineering II; (1996); doi: 10.1117/12.250238
Event: Photonics West '96, 1996, San Jose, CA, United States
Abstract
Large area deposition of YBa2Cu3O7-(delta ) is desirable for cost-effective production of thin superconducting films at larger scale. Our technique of thermal co-evaporation should be particularly well suited for this goal because it is intrinsically homogenous. We have achieved large area deposition by using a rotating disk heater with an oxygen pocket. This arrangement allows for intermittent metal deposition and oxidation scheme with which we fabricate separated zones.Here we present a improved version of this deposition scheme with which we fabricate high quality YBCO films on an area which is 9 inches in diameter. The area is used for simultaneous deposition on smaller wafers, e.g. 12 wafers of 2 inches, or for large sapphire wafers of 8 inches.
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Helmut Kinder, Robert Semerad, Paul Berberich, Bernd Utz, Werner Prusseit, "Very large area YBa2 Cu3O7-δ film deposition", Proc. SPIE 2697, Oxide Superconductor Physics and Nano-Engineering II, (5 July 1996); doi: 10.1117/12.250238; https://doi.org/10.1117/12.250238
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KEYWORDS
Semiconducting wafers

Oxygen

Metals

Superconductors

Oxidation

Sapphire

Thin films

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