Paper
5 July 1996 Very large area YBa2 Cu3O7-δ film deposition
Helmut Kinder, Robert Semerad, Paul Berberich, Bernd Utz, Werner Prusseit
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Abstract
Large area deposition of YBa2Cu3O7-(delta ) is desirable for cost-effective production of thin superconducting films at larger scale. Our technique of thermal co-evaporation should be particularly well suited for this goal because it is intrinsically homogenous. We have achieved large area deposition by using a rotating disk heater with an oxygen pocket. This arrangement allows for intermittent metal deposition and oxidation scheme with which we fabricate separated zones.Here we present a improved version of this deposition scheme with which we fabricate high quality YBCO films on an area which is 9 inches in diameter. The area is used for simultaneous deposition on smaller wafers, e.g. 12 wafers of 2 inches, or for large sapphire wafers of 8 inches.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Helmut Kinder, Robert Semerad, Paul Berberich, Bernd Utz, and Werner Prusseit "Very large area YBa2 Cu3O7-δ film deposition", Proc. SPIE 2697, Oxide Superconductor Physics and Nano-Engineering II, (5 July 1996); https://doi.org/10.1117/12.250238
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Cited by 1 scholarly publication.
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KEYWORDS
Semiconducting wafers

Oxygen

Metals

Superconductors

Oxidation

Sapphire

Thin films

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