Translator Disclaimer
8 April 1996 Practical consequences of matching real laser sources to target illumination requirements
Author Affiliations +
Abstract
UV laser processing as an industrial production step generally requires the beam illumination of target or mask to be of well-defined resolution, intensity and uniformity, and above all reproducible over long periods of time. Real excimer laser sources, despite major improvements over recent years, still deliver beams of non-uniform intensity profile with different beam divergence in each axis. This paper deals with practical approaches to excimer laser energy control, beam shaping and beam homogenization, and the matching of beam illumination optics to projection imaging optics.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Glenn Ogura, Rod Andrew, and Ronald D. Schaeffer "Practical consequences of matching real laser sources to target illumination requirements", Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); https://doi.org/10.1117/12.237757
PROCEEDINGS
11 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT


Back to Top