27 May 1996 248-nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy
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Abstract
A UHV surface analysis system combined with an optical setup was used in the present work to study the conditioning mechanism on MgF2?/LaF3 HR coatings at 248 nm excimer laser wavelength. During laser irradiation of the sample the laser-induced emission of contaminants and coating material from the sample surface was recorded by a quadrupole mass spectrometer. To analyze changes in composition and chemical bonds of the coating surface XPS-measurements were performed before, during and after irradiation in dependence on sample design, number of pulses and oxygen atmosphere.
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Axel Bodemann, Axel Bodemann, Norbert Kaiser, Norbert Kaiser, L. Raupach, L. Raupach, Peter Weissbrodt, Peter Weissbrodt, Erich J. Hacker, Erich J. Hacker, } "248-nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); doi: 10.1117/12.240361; https://doi.org/10.1117/12.240361
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