27 May 1996 Clean-cavity contamination in gas lasers
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A mechanism has been identified which can affect the long-term power output of a high powered gas laser. This mechanism, which is brought about by a process of mobile ion migration in the glass cavity material, is driven by the electric fields set up by the operation of the laser itself. Characteristics of this mechanism and one successful design to overcome its deleterious effects will be discussed. Another mechanism of concern in gas lasers is UV damage to optics. Experiments were carried out in which the UV sensitivity characteristics of new coating materials and designs were determined in a plasma exposure chamber. A method to correlate the UV exposure in the chamber with that under actual laser operating conditions was devised and will be described. Use of this chamber as a testing device eliminates the cost and time required to build a laser for each new material/design iteration. It can also be used as a process control tool for random UV sensitivity checks of production components.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christine E. Geosling, Christine E. Geosling, "Clean-cavity contamination in gas lasers", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); doi: 10.1117/12.240346; https://doi.org/10.1117/12.240346


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