Paper
27 May 1996 In-situ optical coatings on subsurface damage-removed substrate
Kunio Yoshida, T. Hirao, Tomosumi Kamimura, Kanyoshi Ochi, Schukichi Kaku, Hidetsugu Yoshida, Hisanori Fujita, F. Tani, M. Sunagawa, Yoshiaki Okamoto
Author Affiliations +
Abstract
The development of high power lasers requires highly damage-resistant optical coatings. Present multilayer dielectric coatings, do not have sufficient laser-induced damage thresholds (LIDTs) to pulsed lasers, particularly in the short wavelength region. LIDT strongly depends on the absorption coefficient of optical coatings and the impurities on the optical substrate. The absorption coefficient of optical coatings can be minimized by optimizing the deposition conditions. However, the impurities on the optical substrate cannot be completely removed by standard optical cleaning techniques. In this paper, the significant improvement of LIDT of optical coatings on subsurface-damage removed fused silica glass due to ion beam etching is presented.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunio Yoshida, T. Hirao, Tomosumi Kamimura, Kanyoshi Ochi, Schukichi Kaku, Hidetsugu Yoshida, Hisanori Fujita, F. Tani, M. Sunagawa, and Yoshiaki Okamoto "In-situ optical coatings on subsurface damage-removed substrate", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240412
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Optical coatings

Glasses

Silica

Etching

Ion beams

Silicon

Surface roughness

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