27 May 1996 Overview of photothermal characterization of optical thin film coatings
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Abstract
Photothermal techniques are widely used in thin film characterizations and are particularly useful in studying laser-induced damage in optical coatings. The specific applications include measuring weak absorption, characterizing thermal conductivity, detecting local defects, as well as monitoring laser-interaction dynamics and determining laser damage thresholds. In this paper we take an overview of the principle of photothermal techniques, the various detection methods, and the progress made during laser decade in applying these techniques to optical thin films. Further potential and limitations of the techniques will also be discussed, with emphasis on in-situ studies of laser-interaction with thin films and local defects.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhouling Wu, Zhouling Wu, Marshall Thomsen, Marshall Thomsen, Pao-Kuang Kuo, Pao-Kuang Kuo, Y. S. Lu, Y. S. Lu, Christopher J. Stolz, Christopher J. Stolz, Mark R. Kozlowski, Mark R. Kozlowski, } "Overview of photothermal characterization of optical thin film coatings", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); doi: 10.1117/12.240409; https://doi.org/10.1117/12.240409
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