Critical Parameter Control in Electron-Beam Lithography: Proximity Correction and Image Placement
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Formation of submicrometer current-blocking layer for high-power GaAs/AlGaAs quantum wire array laser
Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography
New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile
Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores
Fabrication of 0.25-um electrode width SAW filters using x-ray lithography with a laser plasma source