Khanh B. Nguyen, Daniel A. Tichenor, Kurt W. Berger, Avijit K. Ray-Chaudhuri, Steven J. Haney, Rodney P. Nissen, Yon E. Perras, Richard William Arling, Richard H. Stulen, Linus A. Fetter, Donald M. Tennant, Donald L. White, Obert R. Wood, "Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool," Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996);