27 May 1996 Characterization techniques for x-ray lithography sources
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Abstract
Simple measurements techniques for evaluation of x-ray lithography sources are presented in this paper. Experimental results obtained with this simple method in a point source x-ray system consisting of a Cu target irradiated by a Nd:glass laser agree with complete calculations performed taking into account the spectrum from the x-ray source measured with calibrated crystal and CCD detectors.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juan R. Maldonado, Juan R. Maldonado, Peter M. Celliers, Peter M. Celliers, } "Characterization techniques for x-ray lithography sources", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); doi: 10.1117/12.240494; https://doi.org/10.1117/12.240494
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