Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography

Juergen Gramss; Hans Eichhorn; Uwe Baetz

doi:10.1117/12.240499

27 May 1996 Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography

Juergen Gramss, Hans Eichhorn, Uwe Baetz

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240499
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Constantly growing chip areas, scaling down of pattern sizes, proximity corrections, OPC etc. gives rise to an expansion of layout data. The methods of our JENOPTIK universal exposure systems outlined in this paper serve the purpose of drastically reducing the enormous data volumes. ZBA e-beam systems are capable of processing repeated subpatterns down to runtime format. The ZBA-subpatterns may have any complexity and can be positioned randomly or as an array. Subpatterns are exploded by a fast specific hardware in the very last moment of exposure. Using such repetitive structures, data preprocessing, data transfer and data exposure times are considerably reduced. A suitable data preprocessor is described to provide detecting and saving of substructures.

Citation Download Citation

Juergen Gramss, Hans Eichhorn, and Uwe Baetz "Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240499

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