New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile

Oleg A. Makarov; Zheng Chen; Azalia A. Krasnoperova; Franco Cerrina; Vadim V. Cherkashin; Alexander G. Poleshchuk; Voldemar Petrovich Koronkevich

doi:10.1117/12.240477

27 May 1996 New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile

Oleg A. Makarov, Zheng Chen, Azalia A. Krasnoperova, Franco Cerrina, Vadim V. Cherkashin, Alexander G. Poleshchuk, Voldemar Petrovich Koronkevich

Author Affiliations +

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240477
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The use of the X-ray lithography to produce blazed diffractive optical elements (DOEs) is described. The proposed method allows one to make highly efficient blazed DOE with a deep phase profile (ten wavelengths and more) using a single X-ray mask with a binary transmission pattern. Unlike the well-known multilevel DOEs, blazed ones do not involve fabrication and aligning of a set of masks. DOEs with a profile depth of 10 micrometers and more and zone sizes of down to 1 micrometers can be obtained due to the short wavelength and high penetrability of X- rays. The first experimental samples of blazed DOEs with a 10 micrometers -height profile (lenses and gratings) were fabricated by X-ray lithography with synchrotron radiation using the X-ray masks, prepared in accordance with the pulse-width modulation algorithm. Diffraction efficiency for lenses was measured for white light. It is higher than 80 percent for the central part of the lenses (inside a 10 mm diameter) and about 60 percent for an area of 20 mm diameter.

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Oleg A. Makarov, Zheng Chen, Azalia A. Krasnoperova, Franco Cerrina, Vadim V. Cherkashin, Alexander G. Poleshchuk, and Voldemar Petrovich Koronkevich "New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240477

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