Science and technology policy in the 104th Congress

Zoe Lofgren

doi:10.1117/12.240480

27 May 1996 Science and technology policy in the 104th Congress

Zoe Lofgren

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240480
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

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Zoe Lofgren "Science and technology policy in the 104th Congress", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240480

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