Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes) containing acetal groups

Joo Hyeon Park; Seong-Ju Kim; Ji-Hong Kim; Dong-Chul Seo; Ki-Dae Kim; Sun-Yi Park; Hosull Lee

doi:10.1117/12.241826

14 June 1996 Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes) containing acetal groups

Joo Hyeon Park, Seong-Ju Kim, Ji-Hong Kim, Dong-Chul Seo, Ki-Dae Kim, Sun-Yi Park, Hosull Lee

Author Affiliations +

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241826
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Fully and partially pendant acetal group substituted polyvinylphenols were synthesized by the methods of free radical polymerization and chemical modification on polyvinylphenol, respectively. The glass transition temperature (T_g) of the partially acetal-substituted polyvinylphenols is in the range of 135 degrees to approximately 148 degrees Celsius, which is enough to overcome the thermal treatments for resist processing. The partially acetal- substituted polyvinylphenols are promising materials for chemically amplified negative tone deep UV photoresist.

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Joo Hyeon Park, Seong-Ju Kim, Ji-Hong Kim, Dong-Chul Seo, Ki-Dae Kim, Sun-Yi Park, and Hosull Lee "Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes) containing acetal groups", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241826

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