14 June 1996 Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes) containing acetal groups
Author Affiliations +
Abstract
Fully and partially pendant acetal group substituted polyvinylphenols were synthesized by the methods of free radical polymerization and chemical modification on polyvinylphenol, respectively. The glass transition temperature (Tg) of the partially acetal-substituted polyvinylphenols is in the range of 135 degrees to approximately 148 degrees Celsius, which is enough to overcome the thermal treatments for resist processing. The partially acetal- substituted polyvinylphenols are promising materials for chemically amplified negative tone deep UV photoresist.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joo Hyeon Park, Seong-Ju Kim, Ji-Hong Kim, Dong-Chul Seo, Ki-Dae Kim, Sun-Yi Park, Hosull Lee, "Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes) containing acetal groups", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241826; https://doi.org/10.1117/12.241826
PROCEEDINGS
9 PAGES


SHARE
KEYWORDS
Polymers

Deep ultraviolet

Photoresist materials

Potassium

Polymerization

Carbon

Glasses

Back to Top