14 June 1996 High-throughput process optimization using the EZ technique
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Abstract
The greatest advantage of the EZ method is that it provides a simple, rapid and reliable technique to screen and evaluate the lithographic process. Thorough lithographic and dissolution rate examination can be performed for only the final selections of resist materials and process.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Medhat A. Toukhy, Karin R. Schlicht, Patricia Morra, Somboun Chanthalyma, "High-throughput process optimization using the EZ technique", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241863; https://doi.org/10.1117/12.241863
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