14 June 1996 Manipulation of the thermal properties of positive DUV polymers
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The thermal properties of the blocked polymers used in chemically amplified positive DUV photoresists are critical in determining ultimate resist performance as well as in the selection of processing parameters. Recently it has been shown that baking these resists at or above the glass transition temperature (Tg) significantly improves the delay stability of the resist. However in order to utilize this annealing concept two thermal properties, the Tg and the thermal decomposition temperature (Td), of the blocked polymer must be controlled.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roger F. Sinta, Roger F. Sinta, George G. Barclay, George G. Barclay, Timothy G. Adams, Timothy G. Adams, David R. Medeiros, David R. Medeiros, } "Manipulation of the thermal properties of positive DUV polymers", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); doi: 10.1117/12.241822; https://doi.org/10.1117/12.241822

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