Paper
14 June 1996 Postexposure bake characterization and parameter extraction for positive deep-UV resists through broad-area exposure experiments
Marco Antonio Zuniga, Andrew R. Neureuther
Author Affiliations +
Abstract
This paper presents a methodology for extracting post exposure bake reaction and diffusivity parameters through broad area exposures, without the need for FTIR measurements. The parameter estimates are obtained by varying processing conditions as to achieve the same dissolution rate, and hence the same level of deprotection. Experiments conducted with APEX-E resulted in the following reaction parameter estimates, K1 equals 2.31/sec, K2 equals 0.0038/sec and m equals 1.71, which are in close agreement with values obtained with FTIR data. To calibrate the acid diffusion, top-to-top contact diffusion experiments can be used. Results for APEX-E gave diffusivity estimates for an exponential diffusion model of Do equals 5.6e-6 and (omega) equals 5.8. An analysis of variance conducted on the data shows a constant diffusion model has considerable lack of fit.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marco Antonio Zuniga and Andrew R. Neureuther "Postexposure bake characterization and parameter extraction for positive deep-UV resists through broad-area exposure experiments", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241810
Lens.org Logo
CITATIONS
Cited by 9 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Diffusion

Data modeling

Calcium

FT-IR spectroscopy

Deep ultraviolet

Calibration

Floods

Back to Top