21 May 1996 Efficient workstation-based 3D model for optical alignment simulation
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Abstract
A new workstation-based rigorous 3D model for simulation of light scattering by alignment structures is introduced. The model extends a successful 2D lithography model, and has been applied to the simulation of periodic 3D alignment marks on a resist covered silicon substrate. The theory behind the new model is presented, and examples are given of the model's results and computational efficiency.
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Kevin D. Lucas, Kevin D. Lucas, Chi-Min Yuan, Chi-Min Yuan, Andrzej J. Strojwas, Andrzej J. Strojwas, } "Efficient workstation-based 3D model for optical alignment simulation", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); doi: 10.1117/12.240139; https://doi.org/10.1117/12.240139
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