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7 June 1996 Advancing optical lithography using catadioptric projection optics and step-and-scan
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Abstract
Resolution requirements of below 200nm require the introduction of high-NA catadioptric projection optics and the development of short-wavelength laser illumination. The numerical aperture (NA) of the projection optics available for step-and-scan lithography has now been increased form 0.5 to 0.6 and KrF excimer-laser illumination introduced. This paper examines the initial performance results achieved using the high-NA (0.6) optics illuminated with a KrF excimer laser. Experimental data, using TDUV-009-PM, TDUV-010-PM, and CGR resists is used to illustrate the performance of 0.5 and 0.6 NA optics. Depth of focus and resolution are measured, and initial optics performance results are provided. The linearity of grouped and isolated line features is used to illustrate the lithographic resolution. Lithographic simulations (PROLITH and SPLAT) are used to show the effects of quadrupole illumination for the enhancement of depth of focus with 200nm lithography. The next generation step-and-scan lithography, which uses ArF (193nm) excimer illumination, is discussed. It is indicated that the step-and-scan technique will allow optical lithography to extend to 180nm resolution and below.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Harry Sewell "Advancing optical lithography using catadioptric projection optics and step-and-scan", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240979
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