7 June 1996 Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes
Author Affiliations +
The performance of alternating PSM and its modified type applicable to sub-quarter micron contact holes were studied via both simulations and experiments. We focused on the contact holes as follows: the pitch of one direction was fixed to 0.4micrometers (0.73(lambda) /NA) and the pitches of another direction were varied from 0.4micrometers to 1.6micrometers (2.9(lambda) /NA). Simulations and experiments were performed with a KrF excimer system (0.45 NA and 0.3 coherence factor). The alternating PSM provided benefits in printing highly packed contact holes, whereas the hybrid PSM having a mixed form of alternating PSM and outrigger PSM showed its effects for the contact holes packed only in one direction. It was found that the performance of PSM was strongly affected by duty ratios of the contact holes. In particular, the hybrid PSM improved both the roundness of contact holes and the depth-of- focus, enabling 0.45(lambda) /NA contact holes to be printed. Therefore, either the alternating or the hybrid PSM may extend the lifetime of the optical lithography.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sung-Chul Lim, Sung-Chul Lim, Jongwook Kye, Jongwook Kye, Sang-Gyun Woo, Sang-Gyun Woo, Sunggi Kim, Sunggi Kim, Hoyoung Kang, Hoyoung Kang, Woo-Sung Han, Woo-Sung Han, Young-Bum Koh, Young-Bum Koh, "Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240950; https://doi.org/10.1117/12.240950

Back to Top