7 June 1996 Design considerations and performance of 1-kHz KrF excimer lasers for DUV lithography
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Abstract
The operation of 1 kHz KrF lasers for DUV lithography applications requires a design which minimizes perturbations to the optical and electrical properties of the gas present, at one millisecond intervals in the lasing region and vicinity. The optimum design results from a compromise between electrical and fluid dynamic requirements, since these cannot be simultaneously fully satisfied. Other constraints on a commercially viable design are those rooted in issues such as manufacturability, safety, cost, compatibility with fluorine, and service lifetime of the resulting structure. CYMER has successfully engineered a laser which produces linear average power output scaling with pulse repetition rates to 1 kHz at a line- narrowed bandwidth of less than 0.8 pm. The stabilized pulse energy is 10 mJ with a FWHM of approximately 15 nS, producing an average power of 10W at 1 kHz pulse repetition rate. The 3(sigma) value of pulse energy stability is 5 percent. In addition, the chamber exhibits low fluorine consumption and a lifetime in excess of 2 billion shots. Measured performance data are presented along with a general system layout and facilities requirements.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard G. Morton, Richard G. Morton, Igor V. Fomenkov, Igor V. Fomenkov, William N. Partlo, William N. Partlo, Palash P. Das, Palash P. Das, Richard L. Sandstrom, Richard L. Sandstrom, } "Design considerations and performance of 1-kHz KrF excimer lasers for DUV lithography", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240983; https://doi.org/10.1117/12.240983
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