7 June 1996 Efficient computational techniques for aerial imaging simulation
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Proceedings Volume 2726, Optical Microlithography IX; (1996); doi: 10.1117/12.240963
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States
Abstract
We discuss computational techniques for calculating aerial image intensity distributions from large GDS II files recently implemented in Depict, a photolithography simulator for projection imaging, resist exposure, post-exposure bake and development. In particular, an algorithm for rapid and accurate evaluation of the mask Fourier transform over large domains containing non-uniformly positioned mask elements is implemented. By controlling aliasing errors within the context of a multiple level scheme, this algorithm renders feasible the simulation of aerial images across large portions of integrated circuits. The algorithm also allows overlapping phase mask elements obeying multiplicative transmission rules, and mask element merging. Accuracy for integration of the extended light source is also reported.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Douglas A. Bernard, Jiangwei Li, Juan C. Rey, Khosro Rouz, Valery Axelrad, "Efficient computational techniques for aerial imaging simulation", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240963; https://doi.org/10.1117/12.240963
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KEYWORDS
Photomasks

Computer simulations

Fourier transforms

Cadmium sulfide

Systems modeling

Phase shifts

Airborne remote sensing

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