7 June 1996 Fabrication of submicrometer grating by holographic lithography and shadow deposition of metal or insulator layers
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Abstract
The grating resist patterns with period of 0.235-0.400 micrometers were fabricated by means of the holographic lithography with Ar laser (351.1 nm). The ordinary photoresists AZ-1350 and AZ-5214 were used. These gratings were used as the masks for the usual reactive ion etching as well as the complex substrates for the generation of the submicron metal grating patterns.
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Lolita G. Rotkina, Alexander V. Lunev, Vladimir B. Smirnitskii, Denis A. Prestinskii, "Fabrication of submicrometer grating by holographic lithography and shadow deposition of metal or insulator layers", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240964; https://doi.org/10.1117/12.240964
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