Lithographic lens testing: analysis of measured aerial images, interferometric data, and photoresist measurements

Donis G. Flagello; Bernd Geh

doi:10.1117/12.240940

7 June 1996 Lithographic lens testing: analysis of measured aerial images, interferometric data, and photoresist measurements

Donis G. Flagello, Bernd Geh

Author Affiliations +

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240940
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

This paper shows and discusses the use of direct aerial image measurements and optical interferometry for the evaluation of advanced i-line lenses. These measurement techniques provide direct information on the image forming capabilities of a stepper lens such that assessments of field curvature, astigmatism and image asymmetry can readily be accomplished. The interaction with the photoresist is shown by directly using the measured aerial image and aberration data into photoresist modeling programs such as Prolith/2 and Solid-C. The link between the optical measurements and the photoresist processes is further established by a comparison of simulated and measured results.

Citation Download Citation

Donis G. Flagello and Bernd Geh "Lithographic lens testing: analysis of measured aerial images, interferometric data, and photoresist measurements", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240940

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