7 June 1996 Stepper overlay performance measurements using the air-turbulence-compensated interferometer
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Abstract
Air turbulence affects the performance of the helium-neon interferometer used to control the wafer stage of stepper or step and scan lithography systems. In this paper we describe the principles of operation and in-stepper performance of an air turbulence compensated interferometer designed to address these problems. Collinear combination of a two-wavelength compensation system using second harmonic interferometry, with the existing HeNe interferometer used for length measurement, provides a highly accurate system with real-time compensation for air turbulence. This paper reports on the hardware configuration and preliminary performance evaluation of an ATCI system which has been installed on a semiconductor wafer stepper. A brief overview of the signal processing algorithms is provided, showing the automatic compensation features and noise insensitivity of the algorithm.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philip D. Henshaw, Philip D. Henshaw, } "Stepper overlay performance measurements using the air-turbulence-compensated interferometer", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); doi: 10.1117/12.240942; https://doi.org/10.1117/12.240942
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