Light Scattering Surface Roughness Characterization

John A. Detrio

doi:10.1117/12.931699

30 April 1981 Light Scattering Surface Roughness Characterization

John A. Detrio

Proceedings Volume 0276, Optical Characterization Techniques for Semiconductor Technology; (1981) https://doi.org/10.1117/12.931699
Event: 1981 Microlithography Conferences, 1981, San Jose, United States

Abstract

Light scattering is a sensitive method for characterizing the topography of a smooth, reflecting surface. Particulate contaminants which may influence the yield of semiconductor devices are easily detected in scattered light. Surface irregularities which may influence the lifetime or mobility may be quantitatively evaluated by scattering. The total integrated scatter (TIS) fromoa silicon surface can be related to the rms surface roughness with a sensitivity of 10 Å. Some applications of light scattering to the char-acterization of silicon will be summarized. The TIS method for measuring the surface roughness will be presented in detail.

Citation Download Citation

John A. Detrio "Light Scattering Surface Roughness Characterization", Proc. SPIE 0276, Optical Characterization Techniques for Semiconductor Technology, (30 April 1981); https://doi.org/10.1117/12.931699

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