Dual ion beam sputtering deposition of silicon oxynitride thin films

Francesca Sarto; Antonella Rizzo; Rossella Giorgi; S. Turtu; Salvatore Scaglione

doi:10.1117/12.246825

19 August 1996 Dual ion beam sputtering deposition of silicon oxynitride thin films

Francesca Sarto, Antonella Rizzo, Rossella Giorgi, S. Turtu, Salvatore Scaglione

Proceedings Volume 2776, Developments in Optical Component Coatings; (1996) https://doi.org/10.1117/12.246825
Event: Optical Instrumentation and Systems Design, 1996, Glasgow, United Kingdom

Abstract

The dependence of the silicon oxynitride (SiO_xN_y) refractive index on chemical composition can be employed in producing graded refractive index optical coatings. In this work, SiO_xN_y thin films were deposited by dual ion beam sputtering. Samples with different composition were obtained by making use of SiO₂ and Si targets. The energy and the ion to atom arrival ratio were also varied to study the correlation with the film stoichiometry. Infrared spectroscopy of the vibrational modes was used to investigate the composition of the samples. X-ray photoelectron spectroscopy and x-ray induced auger electron spectroscopy were combined to provide further insight into the chemical composition of the films.

Citation Download Citation

Francesca Sarto, Antonella Rizzo, Rossella Giorgi, S. Turtu, and Salvatore Scaglione "Dual ion beam sputtering deposition of silicon oxynitride thin films", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246825

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